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Motion Stages for Electron and Ion Beam Lithography

  • Precision and accurate positioning
  • Extreme stability down to nm level
  • Ultra high vacuum compatible
  • Un-energized brake

Stages for optical alignment in Photo Lithography provide unmatched stability and positioning accuracy. Stages are designed with a wide range of linear and rotary travel and position resolution down to nm level. Johnson Electric Piezo motor driven stages are ideally suited for E-Beam & Ion Beam machines and vacuum chambers. The motion systems marketed under our Nanomotion brand are UHV compatible to 10-10 Torr and are driven by non-magnetic motors. All axes are closed loop with encoders for position feedback, ranging down to nm level. These highly engineered stages operate at rates up to 200mm/second and have no magnetic materials and no intrinsic magnetic field to disturb beam direction. Nanomotion is an industry leader in vacuum and UHV motors for a variety of semiconductor and life science applications.

德昌电机基于广泛和创新的技术平台,提供了独特的系统解决方案。
  • Extreme stability
  • Unmatched repeatability
  • Ultra high vacuum compatible
  • Hold position with no power

Johnson Electrics' multi axis motion systems, marketed under our Nanomotion brand, are UHV compatible to 10-10 Torr and are driven by non-magnetic motors. All axes are closed loop with encoders for position feedback, ranging down to nm level. These custom engineered stages operate at rates up to 200mm/second and have no magnetic materials and no intrinsic magnetic field to disturb beam direction.

德昌电机基于广泛和创新的技术平台,提供了独特的系统解决方案。
  • Extreme stability
  • Unmatched repeatability
  • Ultra high vacuum compatible
  • Hold position with no power

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