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Motion Stages for Photo Lithography

  • Precision and accurate positioning
  • Extreme stability down to nm level
  • Ultra high vacuum compatible
  • Un-energized brake

Stages for optical alignment in Photo Lithography provide unmatched stability and positioning accuracy. Stages are designed with a wide range of linear and rotary travel and position resolution down to nm level. Johnson Electric Piezo motor driven stages are ideally suited for Photo Lithography machines and vacuum chambers. The motion systems marketed under our Nanomotion brand are UHV compatible to 10-10 Torr and are driven by non-magnetic motors. All axes are closed loop with encoders for position feedback, ranging down to nm level. These highly engineered stages operate at rates up to 200mm/second and have no magnetic materials and no intrinsic magnetic field to disturb beam direction. Nanomotion is an industry leader in vacuum and UHV motors for a variety of semiconductor and life science applications.

德昌电机基于广泛和创新的技术平台,提供了独特的系统解决方案。
  • Extreme stability
  • Unmatched repeatability
  • Ultra high vacuum compatible
  • Hold position with no power

Johnson Electric Piezo motor driven stages are ideally suited for Photo Lithography machines and vacuum chambers. These motion systems are UHV compatible to 10-10 Torr and are driven by non-magnetic motors. All axes are closed loop with encoders for position feedback, ranging down to nm level. These highly engineered stages operate at rates up to 200mm/second and have no magnetic materials and no intrinsic magnetic field to disturb beam direction.

德昌电机基于广泛和创新的技术平台,提供了独特的系统解决方案。
  • Extreme stability
  • Unmatched repeatability
  • Ultra high vacuum compatible
  • Hold position with no power

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